The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Dec. 21, 2000
Richard LaPeruta, Jr., Lititz, PA (US);
Edward Richard Garrity, Jr., Lancaster, PA (US);
Donald Walter Bartch, York, PA (US);
James Francis Edwards, Lancaster, PA (US);
Thomson Licensing S.A., Boulogne Cedex, FR;
Abstract
A method and apparatus of maintaining spacing between tension focus mask strands in a tension focus mask. The method includes providing a tension focus mask comprising busbars with crosswires connected therebetween. A permanent adhesive is applied to the screen-side of the mask strands. Next, novel non-permanent horizontal guide members are attached to the gun-side of the mask strands, where an adhesive is applied to the guide member before the guide members are applied to the mask. The guide members maintain the vertical mask strand spacing during: (1) the application of the horizontal crosswires to the screen-side of the mask and (2) the subsequent thermal processing. The thermal processing cures the adhesive on the screen-side of the mask, thereby: (1) permanently attaching the crosswires to the mask strands and (2) volatilizing the adhesive on the gun-side of the mask strands such that the non-permanent guide member detach from the mask strands.