The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Apr. 07, 2001
Applicant:
Inventors:
Richard LaPeruta, Jr., Lititz, PA (US);
Edward Richard Garrity, Jr., Lancaster, PA (US);
Assignee:
Thomson Licensing S. A., Boulogne-Billancourt, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/907 ; H01J 0/900 ;
U.S. Cl.
CPC ...
H01J 2/907 ; H01J 0/900 ;
Abstract
A method and apparatus of maintaining spacing between tension mask strands in a tension mask. The method includes providing a tension mask with strands connecting therebetween and attaching a set of barrier ridge elements to a first side of the strands. Next, the tension mask is tensioned and affixed to a mask frame to form a mask frame assembly.
LaPeruta, Jr., Richard. (2004). Method and apparatus for maintaining mask strand spatial uniformity (U.S. Patent No. 6781297). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6781297
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile