Richard L C Wu

Title: The Innovative Contributions of Richard L C Wu

Introduction

Richard L C Wu is a notable inventor based in Beavercreek, OH (US). He has made significant contributions to the field of dielectric materials and capacitors. With a total of 2 patents, his work showcases a blend of creativity and technical expertise.

Latest Patents

Wu's latest patents include "Devices having a diamond-like-carbon dielectric" and "Dielectric coatings and use in capacitors." The first patent describes a structural capacitor that incorporates a first carbon fiber material layer, a second carbon fiber material layer, and an interlayer dielectric made of diamond-like-carbon material. The second patent outlines a coated substrate product that consists of a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. This innovative method involves plasma cleaning the substrate's surface and depositing a dielectric coating through a suitable plasma process. The resulting coated products exhibit superior dielectric material properties, making them ideal for manufacturing rolled or parallel plate capacitors with high energy densities.

Career Highlights

Throughout his career, Richard L C Wu has worked with several prominent companies, including Mesoscribe Technologies, Inc. and Morgan Advanced Ceramics Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in dielectric materials.

Collaborations

Wu has collaborated with notable professionals in his field, including William G Baron and Jeffrey A Brogan. These partnerships have further enhanced his innovative capabilities and expanded the impact of his work.

Conclusion

Richard L C Wu's contributions to the field of dielectric materials and capacitors are noteworthy. His patents reflect a commitment to innovation and excellence in engineering. His work continues to influence advancements in technology and materials science.