The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2011

Filed:

Feb. 07, 2006
Applicants:

Fred M. Kimock, Macungie, PA (US);

Steven J. Finke, Kutztown, PA (US);

Richard L. C. Wu, Beavercreek, OH (US);

Inventors:

Fred M. Kimock, Macungie, PA (US);

Steven J. Finke, Kutztown, PA (US);

Richard L. C. Wu, Beavercreek, OH (US);

Assignees:

Morgan Advanced Ceramics, Inc., Hayward, CA (US);

K Systems Corporation, Beavercreek, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01);
U.S. Cl.
CPC ...
Abstract

A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.


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