Location History:
- Castro Valley, CA (US) (1981)
- Richmond, CA (US) (1992)
Company Filing History:
Years Active: 1981-1992
Title: Richard L Bersin: Innovator in Plasma Etching Technology
Introduction
Richard L Bersin is a notable inventor based in Richmond, CA (US). He has made significant contributions to the field of plasma etching technology, holding 2 patents that showcase his innovative approach to semiconductor manufacturing processes.
Latest Patents
Bersin's latest patents include a "Plasma etching device and process" and a "Process and gas for treatment of semiconductor devices." The plasma etching device patent describes a chamber divided into two regions by a perforated screen, where objects to be etched are placed in one region while a plasma is formed in the other. This design facilitates the etching process and includes a structure for heating the etched objects to aid in the removal of photoresist. The second patent outlines a gas plasma process that utilizes a gaseous plasma containing SiF.sub.4 or a mixture of SiF.sub.4 and oxygen. This process is particularly effective for selective etching of Si.sub.3 N.sub.4 and the stripping of photoresist, making it valuable in the manufacture of semiconductor devices.
Career Highlights
Richard L Bersin is currently associated with Branson International Plasma Corporation, where he continues to develop and refine plasma etching technologies. His work has significantly impacted the semiconductor industry, enhancing the efficiency and effectiveness of manufacturing processes.
Collaborations
Bersin has collaborated with notable colleagues such as Frank Scornavacca and Michael J Singleton, contributing to advancements in their field through teamwork and shared expertise.
Conclusion
Richard L Bersin's innovative work in plasma etching technology has established him as a key figure in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes, and his collaborations further enhance the impact of his contributions.