Long Valley, NJ, United States of America

Richard J Lair

This inventor holds 2 USPTO granted patents. Top assignee: Basf Se Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard J Lair. Retrieved from https://idiyas.com/inventor/richard-j-lair

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Richard J. Lair

Introduction

Richard J. Lair is a notable inventor based in Long Valley, NJ (US). He has made significant contributions to the field of electronics and materials science, holding a total of 2 patents. His work focuses on enhancing the performance and durability of electronic components and polymeric materials.

Latest Patents

Lair's latest patents include a method of encapsulating an electronic component. This invention involves an encapsulated electronic assembly that comprises an electronic component and a foamed thermoplastic shell. The shell is formed from a thermoplastic encapsulant that includes a thermoplastic resin and a filler, which is foamed with a foaming agent. The method outlines the steps of melting the thermoplastic encapsulant, foaming it, and injection molding the foamed encapsulant around the electronic component.

Another significant patent is for an article having an impact-resistant surface. This article is manufactured from a polymeric material filled with fibers and features an exterior surface with an impact portion designed to provide enhanced impact resistance. The design includes a unique configuration of ribs that extend from the exterior surface, maximizing the article's durability. The fibers within the polymeric material are aligned parallel to the flow during the molding process, further contributing to the article's strength.

Career Highlights

Richard J. Lair is currently employed at BASF SE Corporation, where he continues to innovate and develop new technologies. His work at BASF has allowed him to apply his expertise in materials science to create solutions that meet industry needs.

Collaborations

Lair has collaborated with notable coworkers, including David M. Lange and Harold Colwell. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Richard J. Lair's contributions to the fields of electronics and materials science are noteworthy. His innovative patents reflect a commitment to enhancing product performance and durability. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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