Encino, CA, United States of America

Richard J Heimer

This inventor holds 3 USPTO granted patents. Top assignees: Tre Semiconductor Equipment Corporation, Kasper Instruments, Inc.. Active years: 1980-1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard J Heimer. Retrieved from https://idiyas.com/inventor/richard-j-heimer-9720zval

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 3

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1980-1984

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Richard J Heimer

Introduction

Richard J Heimer, an accomplished inventor hailing from Encino, CA, has made significant strides in the field of semiconductor manufacturing. With a total of three patents to his name, Heimer's work has positioned him as a notable figure in technological advancements, particularly in photolithographic systems used for semiconductor production.

Latest Patents

Heimer's latest contributions include two groundbreaking patents that enhance the capabilities of mask illumination systems and alignment mechanisms for semiconductor devices. The first patent, titled "Mixer Coupling Lens Subassembly for Photolithographic System," outlines a mask illumination system that features an optical assembly designed with an internal focal plane corresponding to the mask. This innovative setup incorporates a reticle edge masking assembly (REMA) that meticulously defines light patterns projected onto the mask, aiming to reduce blurriness attributed to near field diffraction.

The second patent, "Phase Contrast Alignment System for a Semiconductor Manufacturing," introduces a sophisticated masking apparatus that ensures precise alignment between successive masking operations. By forming alignment targets on semiconductor wafers adjacent to circuit patterns, Heimer's design utilizes a phase contrast microscope to view these targets even when obstructed by highly reflective films. The system incorporates an annular diaphragm and a phase plate to generate a bright edge halo, offering a reliable method for target positioning during subsequent masking steps.

Career Highlights

Throughout his career, Richard J Heimer has garnered experience working with leading companies in the industry. His tenure at Tre Semiconductor Equipment Corporation and Kasper Instruments, Inc. has allowed him to contribute significantly to semiconductor technology. These positions have enabled him to refine his skills in optical systems and semiconductor fabrication techniques, propelling his innovative endeavors forward.

Collaborations

Heimer's collaborations with various teams and organizations have played a crucial role in the development of his patents. By engaging with fellow engineers and researchers, he has been able to leverage collective knowledge and resources, resulting in groundbreaking advancements in the semiconductor sector.

Conclusion

In summary, Richard J Heimer’s innovative spirit and dedication to improving semiconductor manufacturing through his patents reflect a profound impact on the industry. With his insights and inventions, he continues to pave the way for advancements that could shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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