The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1984
Filed:
Aug. 30, 1982
Applicant:
Inventor:
Richard J Heimer, Encino, CA (US);
Assignee:
TRE Semiconductor Equipment Corporation, Woodland Hills, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 71 ; 355 74 ; 355 75 ;
Abstract
A mask illumination system for use in the production of semiconductor devices includes an optical assembly having an internal focal plane corresponding to the mask. A reticle edge masking assembly (REMA) is located at the internal focal plane and serves to define a pattern of light which is projected onto the mask. The provision of the reticle edge masking assembly in a focal plane separate from the mask plane serves to reduce blurriness caused by near field diffraction, as well as facilitating the use of more complex REMA assemblies.