Munich, Germany

Richard Hudeczek

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Intel Corporation. Active years: 2021-2026.

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 6.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2026

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3 patents (USPTO):Explore Patents

Title: Richard Hudeczek: Innovator in Resonant Fin Transistors

Introduction

Richard Hudeczek is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, particularly with his innovative work on resonant fin transistors.

Latest Patents

Richard holds a patent for the Resonant Fin Transistor (RFT). This invention includes embodiments that feature resonators, such as resonant fin transistors. In one embodiment, a resonator comprises a substrate, a set of contact fins over the substrate, a first contact proximate to a first end of the set of contact fins, and a second contact proximate to a second end of the set of contact fins. Additionally, the resonator may include a set of skip fins over the substrate and adjacent to the set of contact fins. Furthermore, the resonator can have a gate electrode positioned over the set of contact fins and the set of skip fins, with the gate electrode located between the first contact and the second contact. Richard has 1 patent to his name.

Career Highlights

Richard is currently employed at Intel Corporation, where he continues to push the boundaries of technology. His work at Intel has allowed him to be at the forefront of innovation in the semiconductor industry.

Collaborations

Richard has collaborated with notable colleagues, including Philipp Riess and Richard Geiger. Their combined expertise contributes to the advancement of technology within their field.

Conclusion

Richard Hudeczek is a distinguished inventor whose work on resonant fin transistors exemplifies innovation in semiconductor technology. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
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