Company Filing History:

11 out of 248

Cascade Microtech, Inc.

patents

1 out of 1

Cascase Microtech, Inc.

patent

Years Active: 1993-2009

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7589518 - Wafer probe station having a skirting component (2009-09-15),

2. 7492147 - Wafer probe station having a skirting component (2009-02-17),

3. 7330023 - Wafer probe station having a skirting component (2008-02-12),

4. 6980012 - Wafer probe station for low-current measurements (2005-12-27),

5. 6720782 - Wafer probe station for low-current measurements (2004-04-13),

6. 6492822 - Wafer probe station for low-current measurements (2002-12-10),

7. 6335628 - Wafer probe station for low-current measurements (2002-01-01),

8. 6232788 - Wafer probe station for low-current measurements (2001-05-15),

9. 5663653 - Wafer probe station for low-current measurements (1997-09-02),

10. 5434512 - Wafer probe station having integrated guarding, Kelvin connection and (1995-07-18),

11. 5345170 - Wafer probe station having integrated guarding, Kelvin connection and (1994-09-06),

12. 5237267 - Wafer probe station having auxiliary chucks (1993-08-17),

Title: The Innovations of Richard H Warner

Introduction

Richard H Warner is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of technology, particularly in the development of advanced probe stations. With a total of 12 patents to his name, Warner's work has had a profound impact on the industry.

Latest Patents

One of Warner's latest patents is for a wafer probe station that features a skirting component. This innovative probe station includes a fully guarded chuck assembly and a connector mechanism designed to enhance sensitivity to low-level currents while minimizing settling times. The chuck assembly consists of a wafer-supporting first chuck element, which is surrounded by a second chuck element. This second element has a lower component, skirting component, and upper component, each designed to guard the first element effectively. The connector mechanism is connected to the second chuck element, allowing the potential on each component to follow that of the first chuck element during low-level current measurements. This design significantly reduces leakage current from the first chuck element, enabling increased current sensitivity. Additionally, the reduced capacitance provided by the second chuck element decreases charging periods, thereby reducing settling times.

Career Highlights

Warner has worked with several prominent companies throughout his career, including Cascade Microtech, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field.

Collaborations

Warner has collaborated with notable colleagues such as Warren K Harwood and Paul A Tervo. These partnerships have fostered an environment of creativity and innovation, leading to the development of advanced technologies.

Conclusion

Richard H Warner's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in probe station technology and beyond.

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