Richard Goldberg

Title: Richard Goldberg: Innovator in Ion Source Technology

Introduction

Richard Goldberg is a notable inventor based in Oslo, Norway. He has made significant contributions to the field of semiconductor fabrication through his innovative designs and technologies. With a total of 2 patents, Goldberg has established himself as a key figure in the development of advanced ion source systems.

Latest Patents

Goldberg's latest patents include the "External Cathode Ion Source" and the "Multi Mode Ion Source." The External Cathode Ion Source is designed for use in semiconductor fabrication. This ion source features an electron emitter that is mounted externally to the ionization chamber, allowing for operation in an arc discharge mode or plasma generation. The design enables a shortened distance between the cathode and the ionization chamber, enhancing efficiency. The Multi Mode Ion Source, on the other hand, operates in both arc discharge and non-arc discharge modes. It consists of dual ionization volumes that form two ion sources, providing versatility in ion implantation systems.

Career Highlights

Goldberg's career has been marked by his dedication to advancing ion source technology. His work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes. His innovative approaches have garnered attention in the industry, positioning him as a leader in his field.

Collaborations

Throughout his career, Richard Goldberg has collaborated with talented individuals such as Thomas N. Horsky and Sami K. Hahto. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in ion source systems.

Conclusion

In summary, Richard Goldberg is a prominent inventor whose work in ion source technology has significantly impacted semiconductor fabrication. His innovative patents and collaborations highlight his commitment to advancing the field.