The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2012

Filed:

May. 13, 2009
Applicants:

Thomas N. Horsky, Boxborough, MA (US);

Richard Goldberg, Melbourne, AU;

Sami K. Hahto, Nashua, NH (US);

Inventors:

Thomas N. Horsky, Boxborough, MA (US);

Richard Goldberg, Melbourne, AU;

Sami K. Hahto, Nashua, NH (US);

Assignee:

SemEquip, Inc., North Billerica, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 27/02 (2006.01); H01J 27/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multi mode ion implantation system, which operates in both an arc discharge mode of operation and a non arc discharge mode of operation, is described. The multi mode ion implantation system may consist of dual ionization volumes forming two ion sources, an arc discharge source and a non arc discharge source, in tandem. The dual chambers and the two sources feed the ion implantation system with material of various species for multi mode, an arc discharge and a non arc discharge operation.


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