Wingdale, NY, United States of America

Richard G Christensen

This inventor holds 5 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1976-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard G Christensen. Retrieved from https://idiyas.com/inventor/richard-g-christensen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.9

ph-index = 4

Forward Citations = 70(Granted Patents)


Location History:

  • Wingdale, NY (US) (1976 - 1985)
  • Pine Plains, NY (US) (1991)

Company Filing History:


Years Active: 1976-1991

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5 patents (USPTO):Explore Patents

Title: Innovations by Richard G Christensen

Introduction

Richard G Christensen is a notable inventor based in Wingdale, NY (US). He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on improving the efficiency and cleanliness of wafer transfer processes, which are critical in the production of high-density semiconductor products.

Latest Patents

One of Christensen's latest patents is the "Wafer transfer apparatus." This invention is designed to support a wafer from below using at least three movable arms, thereby preventing contact with the active surface of the wafer. The apparatus includes a mechanism for moving the arms into and out of the wafer supporting position, which is partially located above the wafer. This design minimizes the risk of contamination from microscopic particles that can fall onto the wafer's active surface. By avoiding sliding contact between elements above the wafer, the invention significantly reduces, if not entirely eliminates, contamination particles produced during the transfer process.

Another significant patent is the "Method and apparatus for making a mask conforming to a ceramic substrate." This invention involves a method and apparatus for creating a mask that conforms to a cured MLC substrate. The mask can be used to add layers of metallization to the substrate through conventional photolithographic techniques. The process features the use of the cured substrate itself to pattern the mask, ensuring precise alignment and image transfer. This innovation also includes methods for improving the MLC substrate by utilizing photolithographic techniques to add successive layers of metallization.

Career Highlights

Richard G Christensen has had a distinguished career at International Business Machines Corporation (IBM). His work has been instrumental in advancing semiconductor manufacturing technologies. His innovative approaches have contributed to the development of cleaner and more efficient manufacturing processes.

Collaborations

Throughout his career, Christensen has collaborated with notable colleagues, including Albert Amendola and John G Yereance, Jr. These collaborations have further enhanced the impact of his inventions in the semiconductor industry.

Conclusion

Richard G Christensen's contributions to semiconductor manufacturing through his innovative patents demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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