Wafer transfer apparatus

Abstract

A wafer transfer apparatus used in manufacturing high density semiconductor products is disclosed which includes at least three movable arms for supporting a wafer from below thereby preventing contact with the active surface of the wafer. A mechanism for moving the arms into and out of its wafer supporting position is diposed, in part, above the wafer when a wafer is supported thereby. The portions of the actuator mechanism disposed above the wafer are constructed in a way such that no sliding contact occurs between elements thereof. Sliding contact between elements disposed above a wafer has proved to produce microscopic particles which can fall onto the active surface of the wafer thereby contaminating the circuits contained thereon. As sliding contact is avoided by the apparatus of the present invention, contamination particles produced within the wafer transfer apparatus is substantially reduced, if not entirely eliminated.