Company Filing History:
Years Active: 2013-2023
Title: The Innovative Contributions of Richard G Abraham
Introduction
Richard G Abraham is a notable inventor based in Sherwood, Oregon, with a remarkable portfolio of nine patents. His work primarily focuses on advancements in electrochemical processes, particularly in the field of metal removal and fabrication techniques.
Latest Patents
Abraham's latest patents include innovative methods for electro-oxidative metal removal in through-mask interconnect fabrication. One implementation describes a cathode designed for electrochemical metal removal, featuring a disc-shaped body with multiple channels for electrolyte flow. These channels may be equipped with non-conductive tubes that extend above the cathode's body, enhancing the efficiency of the process. Additionally, the cathode incorporates indentations at its edge to facilitate electrolyte flow, and fixation elements that allow for easy removal from the apparatus. Another patent outlines a wafer processing method that improves the uniformity of metal fill rates in recessed features by utilizing distinct electrochemical regimes.
Career Highlights
Throughout his career, Richard G Abraham has made significant contributions while working with leading companies in the semiconductor industry, including Lam Research Corporation and Novellus Systems Incorporated. His expertise in electrochemical processes has positioned him as a key figure in advancing manufacturing techniques.
Collaborations
Abraham has collaborated with notable professionals in his field, including Steven T Mayer and Robert Rash. Their combined efforts have contributed to the development of innovative solutions in semiconductor fabrication.
Conclusion
Richard G Abraham's contributions to the field of electrochemical processes and semiconductor fabrication are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical industry.