Richard F Motta

Title: The Innovations of Richard F. Motta

Introduction

Richard F. Motta is a prominent inventor based in Los Altos, California. He has made significant contributions to the field of integrated circuits, holding a total of seven patents. His work focuses on enhancing the efficiency and packing density of MOS transistors used in integrated circuits.

Latest Patents

Motta's latest patents include a self-aligning contact and interconnect structure for MOS transistors. This innovative design allows for higher packing density by utilizing self-aligning source and drain contacts that overlap the gate. The structure is designed to prevent short circuits to the gate through the use of oxide insulation and a layer of silicon nitride. Additionally, contacts to the gate are strategically placed over the active region of the transistor, ensuring protection during the etching process. The use of titanium silicide for contact protection further enhances the reliability of the interconnects, which are formed from doped polysilicon and titanium nitride.

Career Highlights

Richard F. Motta has been instrumental in advancing the technology behind integrated circuits. His work at Paradigm Technology, Inc. has positioned him as a key figure in the development of innovative semiconductor solutions. His patents reflect a deep understanding of the complexities involved in circuit design and fabrication.

Collaborations

Motta has collaborated with notable colleagues such as Norman Godinho and Hsiang-Wen Chen. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Richard F. Motta's contributions to the field of integrated circuits through his innovative patents have significantly impacted the industry. His work continues to influence the design and efficiency of modern electronic devices.