Location History:
- Newark, DE (US) (1982)
- Wilmington, DE (US) (1983 - 1987)
Company Filing History:
Years Active: 1982-1987
Title: Richard E Rocheleau: Innovator in Photochemical Vapor Deposition
Introduction
Richard E Rocheleau is a notable inventor based in Wilmington, DE (US), recognized for his contributions to the field of photochemical vapor deposition. With a total of 5 patents to his name, Rocheleau has made significant advancements in the technology used for the formation of thin films and photovoltaic compounds.
Latest Patents
Rocheleau's latest patents include an "Apparatus and method for photochemical vapor deposition." This innovative apparatus features a reactor housing with a window above a reaction chamber, allowing ultraviolet radiation to penetrate into the reaction zone. A transparent curtain divides the chamber, ensuring that the window remains clear through a gas flow in the flush zone. Another significant patent is for a "Process and apparatus for formation of photovoltaic compounds." This invention details a method for forming and depositing thin films in a vacuum, specifically focusing on the evaporation of cadmium and zinc to create a compound with a predetermined ratio of these elements.
Career Highlights
Throughout his career, Rocheleau has worked with esteemed organizations such as the University of Delaware and Chevron Research Company. His work in these institutions has contributed to the advancement of research in photochemical processes and materials science.
Collaborations
Rocheleau has collaborated with notable colleagues, including Bill N Baron and T W Russell, further enhancing the impact of his work in the field.
Conclusion
Richard E Rocheleau's innovative contributions to photochemical vapor deposition and photovoltaic technology highlight his role as a significant figure in the field of inventions. His patents and collaborations reflect a commitment to advancing technology and materials science.