The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1983
Filed:
Dec. 22, 1981
Applicant:
Inventors:
Richard E Rocheleau, Wilmington, DE (US);
Dennis F Brestovansky, Newark, DE (US);
Peter J Lutz, Wilmington, DE (US);
Assignee:
Chevron Research Company, San Francisco, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
427-8 ; 118666 ; 118725 ; 427 50 ; 427 51 ; 427 55 ; 427 74 ;
Abstract
An apparatus and a method for controlling the temperature of a substrate onto which thin films of semiconductor materials are vapor deposited. The apparatus contains a platen contacting a surface of said substrate over the entire length of the deposition zone; said platen having at least one cavity therein and a rounded edge where said substrate first contacts said platen of the beginning of said deposition zone.