Peter J Lutz

Title: The Innovations of Peter J Lutz

Introduction

Peter J Lutz is an accomplished inventor based in Wilmington, DE. He is known for his significant contributions to the field of semiconductor technology. With a focus on improving the efficiency of thin film deposition processes, Lutz has made strides in substrate temperature control.

Latest Patents

Lutz holds a patent for an "Apparatus and method for substrate temperature control." This invention provides a method for controlling the temperature of a substrate onto which thin films of semiconductor materials are vapor deposited. The apparatus features a platen that contacts the surface of the substrate throughout the entire length of the deposition zone. Notably, the platen includes at least one cavity and a rounded edge where the substrate first contacts the platen at the beginning of the deposition zone. This innovation enhances the precision of temperature management during the deposition process.

Career Highlights

Peter J Lutz is currently employed at Chevron Research Company, where he continues to develop and refine technologies related to semiconductor materials. His work has been instrumental in advancing the capabilities of vapor deposition techniques.

Collaborations

Lutz has collaborated with notable colleagues, including Richard E Rocheleau and Dennis F Brestovansky. Their combined expertise has contributed to the success of various projects within the semiconductor research domain.

Conclusion

Peter J Lutz's innovative work in substrate temperature control exemplifies the impact of dedicated inventors in the field of semiconductor technology. His contributions continue to influence advancements in the industry.