This inventor holds 11 USPTO granted patents and 6 published patent applications. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1978-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Newark, DE (US) (1978 - 1980)
- Wilmington, DE (US) (1980 - 2014)
Company Filing History:
Years Active: 1978-2014
Title: Richard Dale Kinard: Innovator in Atomic Layer Deposition Technology
Introduction
Richard Dale Kinard is a prominent inventor based in Wilmington, DE (US). He holds a total of 11 patents that showcase his contributions to the field of material deposition technologies. His innovative work has significantly advanced the methods used in various industrial applications.
Latest Patents
Among his latest patents is an "Apparatus for atomic layer deposition on a moving substrate." This invention involves a sophisticated apparatus designed to deposit materials on a moving substrate. It features a conveying arrangement that allows for the movement of the substrate along a predetermined path. The coating bar includes a precursor delivery channel that conducts a fluid containing the material to be deposited. The design ensures that the gap between the outlet end of the precursor delivery channel and the substrate is optimized for effective fluid flow.
Another notable patent is the "Film cassette for gaseous vapor deposition." This invention includes a central shaft with end plates and ribs that form a spiral groove to support a film during the deposition process. The design specifications ensure that the cassette can accommodate various film substrates while maintaining optimal conditions for gaseous deposition.
Career Highlights
Richard Dale Kinard is currently employed at E.I. DuPont De Nemours and Company, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of deposition processes in various applications.
Collaborations
Throughout his career, Richard has collaborated with notable colleagues, including Kirstin H. Shilkitus and Donald W. Edwards. These collaborations have contributed to the advancement of technologies in their respective fields.
Conclusion
Richard Dale Kinard's contributions to atomic layer deposition technology and gaseous vapor deposition have made a significant impact in the industry. His innovative patents and ongoing work at E.I. DuPont De Nemours and Company highlight his dedication to advancing material deposition methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile