The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Dec. 16, 2010
Geoffrey Nunes, Swarthmore, PA (US);
Richard Dale Kinard, Wilmington, DE (US);
Geoffrey Nunes, Swarthmore, PA (US);
Richard Dale Kinard, Wilmington, DE (US);
E I du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Zto a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Zto the flow therethrough. The restrictor is sized such that the impedance Zis at least five (5) times, and more preferably at least fifteen (15) times, the impedance Z. The impedance Zhas a friction factor f. The restrictor in the precursor delivery channel is sized such that the impedance Zhas a friction factor f that is less than 100, and preferably less than 10.