The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Aug. 31, 2009
Peter Francis Carcia, Wilmington, DE (US);
Calixto Estrada, Middletown, DE (US);
Richard Dale Kinard, Wilmington, DE (US);
Robert Scott Mclean, Hockessin, DE (US);
Kirstin H. Shilkitus, Landenberg, PA (US);
Peter Francis Carcia, Wilmington, DE (US);
Calixto Estrada, Middletown, DE (US);
Richard Dale Kinard, Wilmington, DE (US);
Robert Scott McLean, Hockessin, DE (US);
Kirstin H. Shilkitus, Landenberg, PA (US);
E I du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
A cassette for supporting a film during a gaseous vapor deposition has first and second end plates. A rib on each end plate forms a spiral groove that edgewise receives a spiral wrapping of a film having a width greater than 300 mm. Spaces between turns of the film wrapping define a gas flow channel and spaces between adjacent turns of the rib define a plurality of inlet openings in one end plate that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing.