Richard D Coyne

Title: Richard D. Coyne: Innovator in Semiconductor Technology

Introduction

Richard D. Coyne is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor wafer processing.

Latest Patents

Richard D. Coyne holds a patent for an "Apparatus for vapor sheathed baking of semiconductor wafers." This invention involves a heat treating apparatus where semiconductor wafers are baked on a circular hot plate while being sheathed with a uniform vapor flow. The preferred vapor is a mixture of a relatively large volume of nitrogen carrying a relatively small volume of HMDS. After passing over the wafer, the vapor sheath is drawn through an annular gap into an exhaust chamber that surrounds and underlies the hot plate. This design avoids heat and vapor loss into other portions of the semiconductor fabrication line, where the baking apparatus is typically incorporated. He has 1 patent to his name.

Career Highlights

Richard D. Coyne is associated with GCA Corporation, where he has been instrumental in advancing semiconductor processing technologies. His work has contributed to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include John Blechschmid and David Palmer. Their collaborative efforts have further enhanced the innovations within the company.

Conclusion

Richard D. Coyne's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the efficiency of semiconductor manufacturing processes.