The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1985
Filed:
May. 23, 1983
John Blechschmid, Chagrin Falls, OH (US);
Richard D Coyne, San Jose, CA (US);
David Palmer, Andover, MA (US);
John A Piatt, Sunnyvale, CA (US);
GCA Corporation, Bedford, MA (US);
Abstract
In the heat treating apparatus disclosed herein, semiconductor wafers are baked on the circular hot plate while being sheathed with a uniform vapor flow. The preferred vapor is a mixture of a relatively large volume of nitrogen carrying a relatively small volume of HMDS. After passing over the wafer, the vapor sheath is drawn, through an annular gap, into an exhaust chamber which surrounds and underlies the hot plate thereby avoiding heat and vapor loss into the other portions of the semiconductor fabrication line within which the baking apparatus is typically incorporated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile