Richard Ciszek

Title: The Innovative Contributions of Richard Ciszek

Introduction

Richard Ciszek is a notable inventor based in Phoenix, AZ, who has made significant contributions to the field of chemical mechanical planarization (CMP). With a total of four patents to his name, Ciszek has developed innovative systems that enhance the efficiency and effectiveness of wafer processing.

Latest Patents

One of Ciszek's latest patents is a chemical mechanical planarization carrier system. This system features a CMP carrier that includes a resilient flexible membrane upon which a wafer is mounted. It incorporates at least three ports for supplying air to the membrane, allowing for pneumatic pressure to be applied uniformly across the wafer's surface. Each port is designed to provide pressure to different components of the carrier, enabling adjustments during the wafer processing. Additionally, the system includes a processor and software program that integrates the CMP carrier with existing CMP machines. The software application converts the air pressure applied to the carrier into units that the CMP machine can interpret, ensuring it operates according to the expected commands.

Career Highlights

Ciszek has worked with several companies throughout his career, including Axus Technology LLC and Axus Technologies, LLC. His experience in these organizations has allowed him to refine his skills and contribute to advancements in CMP technology.

Collaborations

Some of Ciszek's notable coworkers include Daniel R. Trojan and Clifford Daniel. Their collaboration has likely played a role in the development of innovative solutions in the field.

Conclusion

Richard Ciszek's work in the realm of chemical mechanical planarization has led to significant advancements in wafer processing technology. His innovative patents and career contributions highlight his importance as an inventor in this specialized field.