Richard Bytheway

Title: The Innovative Contributions of Richard Bytheway

Introduction

Richard Bytheway is a notable inventor based in Durham, GB. He has made significant contributions to the field of X-ray diffraction analysis. His innovative approach has led to the development of a unique method that enhances the measurement of X-ray diffraction from tilted layers.

Latest Patents

Richard Bytheway holds a patent for a method titled "Fast measurement of X-ray diffraction from tilted layers." This method involves directing a converging beam of X-rays toward a surface of a sample that consists of multiple single-crystal layers. The process includes at least a first layer and a second layer, which is formed over and tilted relative to the first layer. The X-rays that are diffracted from each of these layers are sensed simultaneously. The sensed X-rays are resolved as a function of angle to generate a diffraction spectrum that includes at least a first diffraction peak due to the first layer and a second diffraction peak due to the second layer. This diffraction spectrum is then analyzed to identify a characteristic of at least the second layer.

Career Highlights

Richard Bytheway is associated with Jordan Valley Semiconductors Ltd., where he applies his expertise in X-ray diffraction. His work has been instrumental in advancing the technology used in semiconductor manufacturing and materials analysis.

Collaborations

Richard has collaborated with notable colleagues, including John Leonard Wall and David Jacques. Their combined efforts have contributed to the success of various projects within their field.

Conclusion

Richard Bytheway's innovative work in X-ray diffraction analysis exemplifies the impact of dedicated inventors in advancing technology. His contributions continue to influence the field and enhance our understanding of material properties.