Richard Buttinger

Title: Richard Buttinger: Innovator in Photolithography Technology

Introduction

Richard Buttinger is a notable inventor based in Landshut, Germany. He has made significant contributions to the field of photolithography, particularly through his innovative designs that enhance the efficiency of mask alignment processes.

Latest Patents

Richard Buttinger holds a patent for a "Device for aligning masks in photolithography." This invention provides a device that features a first mask holder for a first mask, which can accommodate at least one adapter for a second mask. This design allows for the use of masks that are adapted to either the first mask holder or the adapter. The invention is advantageous as it facilitates an easy, time-saving, and cost-effective changeover from one mask size to at least one different mask size. He has 1 patent to his name.

Career Highlights

Richard Buttinger is associated with Suss Microtec Lithography GmbH, a company known for its advanced lithography solutions. His work at the company has positioned him as a key player in the development of innovative technologies in the photolithography sector.

Collaborations

Some of his notable coworkers include Nikolaus Maier and Ralf Süss, who have collaborated with him on various projects within the company.

Conclusion

Richard Buttinger is a distinguished inventor whose work in photolithography has led to advancements that benefit the industry. His innovative approach to mask alignment continues to influence the field positively.