The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Oct. 31, 2002
Applicants:
Nikolaus Maier, Garching, DE;
Ralf Süss, München, DE;
Richard Buttinger, Landshut, DE;
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/62 ; G03B027/58 ; G03B027/42 ;
U.S. Cl.
CPC ...
Abstract
The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.