Company Filing History:
Years Active: 2005
Title: Nikolaus Maier: Innovator in Photolithography
Introduction
Nikolaus Maier is a prominent inventor based in Garching, Germany. He has made significant contributions to the field of photolithography, particularly through his innovative designs and patents. His work is instrumental in advancing technologies that rely on precise mask alignment.
Latest Patents
Nikolaus Maier holds a patent for a "Device for aligning masks in photolithography." This invention provides a device that features a first mask holder for a first mask, which can accommodate at least one adapter for a second mask. This design allows for the use of masks that are adapted to either the first mask holder or the adapter. The invention is advantageous as it facilitates an easy, time-saving, and cost-effective changeover from one mask size to another.
Career Highlights
Nikolaus Maier is associated with SUSS Microtec Lithography GmbH, a company known for its expertise in lithography technology. His role at the company has allowed him to contribute to various projects that enhance the efficiency and effectiveness of photolithography processes.
Collaborations
Throughout his career, Nikolaus has collaborated with notable colleagues, including Ralf Süss and Richard Buttinger. These collaborations have fostered an environment of innovation and have led to advancements in the field.
Conclusion
Nikolaus Maier's contributions to photolithography through his patent and work at SUSS Microtec Lithography GmbH highlight his role as a key innovator in the industry. His inventions continue to influence the efficiency of mask alignment processes in photolithography.