Cambridge, United Kingdom

Richard Anthony Lione

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Other. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard Anthony Lione. Retrieved from https://idiyas.com/inventor/richard-anthony-lione

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Richard Anthony Lione: Innovator in Plasma Processing Technology

Introduction

Richard Anthony Lione is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique plasma processing apparatus.

Latest Patents

Richard holds 1 patent for his invention titled "Plasma processing apparatus." This apparatus is designed for processing a substrate using plasma. It features a process chamber where the processing occurs, a plasma source that provides plasma to the chamber, and a substrate mount that holds the substrate, equipped with a surface containing multiple apertures.

Career Highlights

Throughout his career, Richard has worked with various companies, including Lingvitae Holding. His work has focused on advancing technologies that utilize plasma for various applications.

Collaborations

Richard has collaborated with notable individuals in his field, including Gareth Hennighan and Gianfranco Aresta. These collaborations have contributed to the development and refinement of his innovative technologies.

Conclusion

Richard Anthony Lione is a distinguished inventor whose work in plasma processing technology has made a significant impact. His patent and collaborations reflect his commitment to innovation in this specialized field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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