The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Jun. 13, 2018
Applicant:
Hzo, Inc., Morrisville, NC (US);
Inventors:
Andrew Simon Hall Brooks, Melbourn, GB;
Gareth Hennighan, Bassingbourn, GB;
Gianfranco Aresta, Hitchin, GB;
Richard Anthony Lione, Cambridge, GB;
Shailendra Vikram Singh, Cambridge, GB;
Siobhan Marie Woollard, Melbourn, GB;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/509 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32715 (2013.01); C23C 16/4583 (2013.01); C23C 16/509 (2013.01); H01J 37/32532 (2013.01); H01J 37/32082 (2013.01);
Abstract
A plasma processing apparatus for processing a substrate using a plasma, comprising: a process chamber in which the processing takes place; a plasma source for providing a plasma to the process chamber; a substrate mount within the process chamber for holding the substrate, the substrate mount comprising a surface having a plurality of apertures.