Lawrenceville, NJ, United States of America

Richard A Linke

This inventor holds 1 USPTO granted patent. Top assignee: Nec Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard A Linke. Retrieved from https://idiyas.com/inventor/richard-a-linke-lugobqv0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Richard A. Linke and His Rewritable-Wavelength Semiconductor Laser

Introduction

Richard A. Linke is an inventor associated with Lawrenceville, New Jersey, and NEC Corporation. His work includes a patent for a semiconductor laser whose operating wavelength can be changed by rewriting a grating in photorefractive material.

Latest Patents

Linke is credited with 1 patent: “Semiconductor Laser with a Rewritable Wavelength Stabilizer.” The invention uses a grating written into photorefractive material as a laser mirror, with the grating’s period determining the laser diode’s oscillation wavelength. By changing the material’s temperature and illuminating it under specified conditions, the grating can be erased and rewritten, allowing the laser’s wavelength to be changed repeatedly. Operating the diode at low temperature helps preserve the grating.

Career Highlights

Linke’s documented patent work connects him with NEC Corporation and focuses on semiconductor laser wavelength control. The patent describes a method for adjusting a laser’s wavelength through a rewritable optical grating.

Collaborations

Hirohito Yamada is identified as Linke’s coworker. The available information does not specify his role in the patent or the invention.

Conclusion

Richard A. Linke’s patent presents a rewritable-grating approach to changing and stabilizing a semiconductor laser’s wavelength.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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