Richard A Gough

Title: Richard A. Gough: Innovator in Lithography Systems

Introduction

Richard A. Gough is a notable inventor based in Kensington, CA (US). He has made significant contributions to the field of lithography systems, holding a total of 2 patents. His work focuses on advanced technologies that enhance the precision and efficiency of semiconductor manufacturing.

Latest Patents

One of Gough's latest patents is the "Maskless Micro-Ion-Beam Reduction Lithography System." This innovative system projects patterns onto a resist layer on a wafer with feature sizes down to below 100 nm. The MMRL system operates without a stencil mask, generating patterns by switching beamlets on and off from a two-electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source, followed by a beam reduction and acceleration column.

Another significant patent is the "Focused Ion Beam System." This system produces a final beam spot size down to 0.1 µm or less, with an ion beam output current on the order of microamps. The FIB system increases ion source brightness by properly configuring the first (plasma) and second (extraction) electrodes. It can be used for nanolithography and doping applications for the fabrication of semiconductor devices with minimum feature sizes of 0.1 µm or less.

Career Highlights

Richard A. Gough is affiliated with the University of California, where he continues to push the boundaries of technology in semiconductor manufacturing. His work has been instrumental in developing systems that enhance the capabilities of lithography processes.

Collaborations

Gough has collaborated with notable colleagues, including Ka-Ngo Leung and Qing Ji. Their combined expertise has contributed to advancements in the field of lithography and semiconductor technology.

Conclusion

Richard A. Gough is a prominent inventor whose work in lithography systems has significantly impacted semiconductor manufacturing. His innovative patents reflect his commitment to advancing technology in this critical field.