Location History:
- Dutchess County, NY (US) (1996 - 1998)
- Pleasant Valley, NY (US) (1999 - 2006)
Company Filing History:
13 out of 164,108 
1 out of 5,259 
Years Active: 1996-2006
Title: **The Innovative Contributions of Richard A. Ferguson**
Introduction
Richard A. Ferguson, based in Pleasant Valley, NY, is a prolific inventor known for his contributions to photolithography and semiconductor manufacturing. With 13 patents to his name, Ferguson has been instrumental in advancing technologies that enhance precision in mask layout optimization.
Latest Patents
One of Ferguson's latest patents is titled "Binary OPC for Assist Feature Layout Optimization." This innovative method focuses on the formation of a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements. The process involves correcting for proximity effects in pattern imaging through several key steps, including:
1. Developing a layout of mask features for printing main pattern features.
2. Designing a table of SRAF element data that includes:
- Spacing of main pattern features and SRAF elements.
- Applying SRAF elements to the mask layout based on the spacing dynamics.
- Legalizing SRAF elements according to specific style options.
- Providing a modified layout for the target pattern that identifies problem edge segments at risk of causing printing defects.
- Applying a selected bias to these problem areas to mitigate risks of SRAF element loss.
- Outputting a modified pattern that effectively removes regions of SRAF element loss.
This advanced method enhances the reliability and efficiency of semiconductor fabrication.
Career Highlights
Throughout his career, Richard A. Ferguson has worked with notable corporations including IBM and Lockheed Martin Corporation. His innovations have not only influenced the companies’ growth but also the broader semiconductor industry. His expertise and patent portfolio position him as a key player in the field.
Collaborations
Ferguson has collaborated with fellow innovators such as Lars W. Liebmann and Alfred K. Wong. These professional relationships have further enriched his experience and contributed to his success as an inventor.
Conclusion
Richard A. Ferguson's contributions to the field of photolithography and semiconductor technology exemplify the spirit of innovation. His dedication to developing methods that optimize mask layouts showcases his commitment to advancing electronic manufacturing processes. Through his work, Ferguson continues to leave a lasting impact on the technology landscape.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.