The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Aug. 21, 1997
William J Adair, Underhill, VT (US);
Richard A Ferguson, Pleasant Valley, NY (US);
Mark C Hakey, Milton, VT (US);
Steven J Holmes, Milton, VT (US);
David V Horak, Essex Junction, VT (US);
Robert K Leidy, Burlington, VT (US);
William Hsioh-Lien Ma, Fishkill, NY (US);
Ronald M Martino, Danbury, CT (US);
Song Peng, South Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.