The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Aug. 03, 1998
Applicant:
Inventors:
Lars W Liebmann, Poughquag, NY (US);
Richard A Ferguson, Pleasant Valley, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ; 356376 ; 356356 ;
Abstract
A focus monitor for establishing best focus of a lithographic system in semiconductor wafers. The focus monitor has a phase region having a first phase and a slot disposed within the phase region having a gap size indicative of a defocus level of the lithographic system.
Quick Actions:
Liebmann, Lars. (1999). Focus monitor for alternating phase shifted masks (U.S. Patent No. 5936738). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5936738
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile