Location History:
- Eagle Pass, TX (US) (1989)
- Hopewell Junction, NY (US) (1992 - 2015)
Company Filing History:
3 out of 3 
2 out of 164,244 
2 out of 832,912 Years Active: 1989-2015
Title: Innovator Ricardo Indalecio Fuentes: Pioneering Substrate Holding Technology
Introduction
Ricardo Indalecio Fuentes, an accomplished inventor based in Hopewell Junction, NY, has made significant contributions to the field of semiconductor processing through his seven patents. His innovative approaches focus on enhancing the efficiency and precision of handling substrates during various processes, showcasing his commitment to advancing technology in this critical sector.
Latest Patents
One of Fuentes' notable inventions is a "Device and method for holding a substrate," which allows semiconductor wafers to be securely held during processes such as liquid meniscus applications. This device features holding components, designed to contact only the second side of the substrate, thereby avoiding interference with any structures on the first side. This meticulous design ensures that critical features on the substrate remain unharmed throughout processing.
Another key patent is the "Wet processing using a fluid meniscus apparatus." This innovative apparatus and methodology leverage a fluid meniscus to effectively process surfaces of objects. The flexibility of this approach allows for various processing techniques, including coating, etching, and plating. Particularly valuable in the semiconductor industry, this method facilitates the treatment of multiple surfaces of electronic components, enhancing overall production capabilities.
Career Highlights
Fuentes has built a solid career with impactful roles at Materials and Technologies Corporation, among other companies. His work has consistently demonstrated a blend of ingenuity and technical proficiency, securing his recognition in the field of semiconductor processing.
Collaborations
Throughout his career, Fuentes has collaborated with fellow innovator Inna V. Babich, contributing to joint efforts that have inevitably shaped advancements in substrate handling and wet processing techniques.
Conclusion
Ricardo Indalecio Fuentes stands out as a significant figure in the world of innovations related to semiconductor processing technology. His work continues to influence the industry, driving forward the methodologies that enhance the effectiveness of handling substrates. With a track record of successful patents and noteworthy collaborations, Fuentes is undoubtedly a pioneering inventor in his field.