The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Oct. 16, 2006
Applicant:
Ricardo I. Fuentes, Hopewell Junction, NY (US);
Inventor:
Ricardo I. Fuentes, Hopewell Junction, NY (US);
Assignee:
Materials and Technologies Corporation, Poughkeepsie, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/67 (2006.01); C25D 5/02 (2006.01); C23C 18/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); H01L 21/67057 (2013.01); H01L 21/6715 (2013.01); C25D 5/02 (2013.01); C23C 18/161 (2013.01); Y10S 134/902 (2013.01);
Abstract
A wet processing apparatus and method that takes advantage of a fluid meniscus to process at least a portion of a surface of an object. After one surface of the object has been processed another side or surface of the object can be similarly processed. This processing can be coating, etching, plating, to name a few. An application of the apparatus and method is in the semiconductor processing industry, especially, the processing of wafers and substrates. The method and apparatus also allows the processing of multiple surfaces of an electronic component.