Ria Someshwar

Title: Ria Someshwar: Innovator in Semiconductor Technology

Introduction

Ria Someshwar is a prominent inventor based in Mountain View, CA (US). She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approaches.

Latest Patents

Ria's latest patents include methods for forming semiconductor structures and annealing processes for memory devices. The first patent describes a method that involves patterning a substrate to create openings over n and p transistors, pre-cleaning the substrate, and depositing a titanium silicide (TiSi) layer using plasma-enhanced chemical vapor deposition (PECVD). This method allows for the selective formation of a molybdenum silicide (MoSi) layer and the annealing of the semiconductor structure without breaking vacuum. The second patent focuses on exemplary methods of forming a memory structure, which includes annealing a transition-metal-and-oxygen-containing material at temperatures exceeding 500°C for a brief duration.

Career Highlights

Ria Someshwar is currently employed at Applied Materials, Inc., where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in advancing the efficiency and performance of semiconductor devices.

Collaborations

Ria collaborates with talented individuals such as Siddarth A Krishnan and Seshadri Ganguli, contributing to a dynamic and innovative work environment.

Conclusion

Ria Someshwar's contributions to semiconductor technology through her patents and work at Applied Materials, Inc. highlight her role as a leading innovator in the field. Her advancements are paving the way for future developments in semiconductor structures and memory devices.