Ri Chen

Title: The Innovative Contributions of Ri Chen

Introduction

Ri Chen is a prominent inventor based in Beijing, China, known for his significant contributions to display technology. With a total of two patents to his name, he has made strides in the development of advanced display substrates and shift register units.

Latest Patents

Ri Chen's latest patents include a display substrate that features multiple cascaded shift register units and a preparation method for the same. This innovative display substrate comprises an underlay substrate along with several semiconductor and conductive layers arranged strategically. The first semiconductor layer contains an active layer of at least one transistor of a second semiconductor type, while the first conductive layer includes a control electrode for this transistor. Additionally, the second semiconductor layer features an active layer of at least one transistor of a first semiconductor type, with its corresponding conductive layer providing necessary control electrodes. His other patent focuses on a shift register unit that includes an input circuit, control circuits, and an output circuit, designed to enhance the efficiency of display technologies.

Career Highlights

Throughout his career, Ri Chen has worked with notable companies such as Chongqing BOE Display Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in display technology.

Collaborations

Ri Chen has collaborated with talented individuals in the field, including coworkers Teng Chen and Faming Jiang. Their collective expertise has fostered an environment of innovation and creativity.

Conclusion

Ri Chen's work in display technology exemplifies the spirit of innovation and dedication to advancing the field. His patents reflect a deep understanding of complex systems and a commitment to improving display technologies.