Company Filing History:
Years Active: 2005-2007
Title: The Innovations of Rex K Frost
Introduction
Rex K Frost is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuit manufacturing, holding a total of 4 patents. His work focuses on enhancing the precision and efficiency of printing features on substrates.
Latest Patents
One of Rex K Frost's latest patents is titled "Accommodating diffraction in the printing of features on a substrate." This invention involves a method that identifies a pair of features to be printed using corresponding patterning elements. It increases the separation distance between these elements while maintaining a sufficiently small pitch between the imaged features. This approach addresses the challenges posed by diffraction, ensuring that the printed features maintain their intended separation.
Another significant patent is "Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow." This invention focuses on reducing critical dimensions and feature sizes in integrated circuit manufacturing. The method controls photoresist flow rates to develop critical dimensions beyond the resolution limits of the photoresist material. By modifying the resist material characteristics through exposure to electrons, photons, or ions, the post-exposure resist becomes easier to control during subsequent reflow processes.
Career Highlights
Rex K Frost is currently employed at Intel Corporation, where he continues to innovate and contribute to advancements in technology. His work has been instrumental in pushing the boundaries of what is possible in integrated circuit design and manufacturing.
Collaborations
Rex has collaborated with notable professionals in his field, including Swaminathan (Sam) Sivakumar. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.
Conclusion
Rex K Frost's contributions to the field of integrated circuits through his innovative patents and work at Intel Corporation highlight his importance as an inventor. His advancements in printing techniques and photoresist materials continue to influence the industry significantly.