The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Oct. 08, 2003
Swaminathan (Sam) Sivakumar, Portland, OR (US);
Rex K. Frost, Hillsboro, OR (US);
Phi Nguyen, Hillsboro, OR (US);
Swaminathan (Sam) Sivakumar, Portland, OR (US);
Rex K. Frost, Hillsboro, OR (US);
Phi Nguyen, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A mask pattern may be decomposed into two or more masks, each having a pitch greater than that of the original mask pattern. New, 'partial-pattern' masks may be created for each of the new mask patterns. The original mask pattern is transferred to the photoresist for the corresponding layer using a multiple exposure technique in which the photoresist is exposed with each of the partial-pattern masks individually, e.g., back-to-back in a pass through a scanner, to define all of the features in the original pattern.