Jiangsu, China

Rengang Qin

This inventor holds 1 USPTO granted patent. Top assignee: Csmc Technologies Fab1 Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rengang Qin. Retrieved from https://idiyas.com/inventor/rengang-qin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Rengang Qin: Innovator in Capacitor Technology

Introduction

Rengang Qin is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of capacitor technology, particularly through his innovative patent that enhances the performance of capacitors.

Latest Patents

Rengang Qin holds a patent for a capacitor and its preparation method. This invention introduces a structure of low pressure tetraethyl orthosilicate—low pressure silicon nitride—low pressure tetraethyl orthosilicate, which replaces the traditional oxide-nitride-oxide structure found in existing capacitors. The new design offers a relatively high unit capacitance value. Additionally, the fabrication process utilizes low pressure chemical vapor deposition at lower temperatures, minimizing heat production and preventing damage to semiconductor devices.

Career Highlights

Rengang Qin is currently employed at Csmc Technologies Fab1 Co., Ltd. His work focuses on advancing capacitor technology, which is crucial for various electronic applications. His innovative approach has positioned him as a key figure in the development of high-performance capacitors.

Collaborations

Rengang Qin collaborates with talented coworkers, including Dejin Wang and Boyong He. Their combined expertise contributes to the success of their projects and the advancement of capacitor technology.

Conclusion

Rengang Qin's contributions to capacitor technology through his innovative patent demonstrate his commitment to enhancing electronic components. His work continues to influence the field and pave the way for future advancements in capacitor design and fabrication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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