Rene Henricus Jozef Vervuurt

Title: The Innovations of Rene Henricus Jozef Vervuurt

Introduction

Rene Henricus Jozef Vervuurt is a notable inventor based in Heverlee, Belgium. He has made significant contributions to the field of technology, particularly in the area of thin film deposition. His innovative approaches have led to advancements that are crucial for various applications in the industry.

Latest Patents

Vervuurt holds a patent for "Methods and apparatuses for flowable gap-fill." This patent describes methods and apparatuses for the flowable deposition of thin films. The invention includes cyclical processes for gap-fill, where deposition is followed by a thermal anneal and repeated. In some embodiments, the deposition and thermal anneal are conducted in separate stations. Additionally, the second module can be heated to a higher temperature than the first station, and the thermal anneal may comprise Rapid Thermal Annealing (RTA).

Career Highlights

Vervuurt is associated with Asm IP Holding B.V., a company that specializes in providing advanced semiconductor equipment and solutions. His work at the company has allowed him to explore and develop innovative technologies that enhance manufacturing processes.

Collaborations

Throughout his career, Vervuurt has collaborated with esteemed colleagues such as Shinya Yoshimoto and Takahiro Onuma. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Rene Henricus Jozef Vervuurt is a distinguished inventor whose work in thin film deposition has made a significant impact in the technology sector. His patent and collaborations reflect his commitment to advancing the field and driving innovation forward.