Asm IP Holding B.v.

Rene Henricus Jozef Vervuurt

Yukihiro Mori

Hideaki Fukuda

Timothee Blanquart

Takahiro Onuma

Makoto Igarashi

Shinya Yoshimoto

In accordance with some embodiments herein, methods and apparatuses for flowable deposition of thin films are described. Some embodiments herein relate to cyclical processes for gap-fill in which deposition is followed by a thermal anneal and repeated. In some embodiments, the deposition and thermal anneal are carried out in separate station. In some embodiments second module is heated to a higher temperature than the first station. In some embodiments, the thermal anneal comprises RTA.

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Heverlee, Belgium

Rene Henricus Jozef Vervuurt