Company Filing History:
Years Active: 2007-2015
Title: Innovations of Rene Blanquies
Introduction
Rene Blanquies is an accomplished inventor based in San Jose, CA. She has made significant contributions to the field of photolithography, particularly in the calibration of computer simulations. With a total of 3 patents to her name, her work has had a notable impact on the industry.
Latest Patents
One of her latest patents is focused on the verification of computer simulation of the photolithographic process. This method involves calibrating a computer program that simulates a physical process and a photomask. A first physical artifact is exposed to the physical process to produce a second physical artifact. The first physical artifact includes features characterized by traceably measured known dimensions. The features of the second physical artifact are then measured to produce one or more measured dimensions. The physical process is simulated using the known dimensions of the first physical artifact as inputs to generate an output. This output is compared to the measured dimensions of the second physical artifact to produce a result. A figure of merit is assigned to the computer simulation based on this result. The photomask also has features with traceably measured dimensions.
Career Highlights
Rene Blanquies is currently employed at KLA-Tencor Corporation, where she continues to innovate in her field. Her expertise in photolithography and computer simulations has positioned her as a key player in the industry.
Collaborations
Throughout her career, Rene has collaborated with notable colleagues, including Marco Tortonese and Jerry Prochazka. These collaborations have further enhanced her contributions to the field.
Conclusion
Rene Blanquies is a pioneering inventor whose work in photolithography and computer simulations has led to significant advancements in the industry. Her patents reflect her commitment to innovation and excellence.