This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 1995-1996.
Company Filing History:
Years Active: 1995-1996
Title: Remi Numata: Innovator in Photoresist Technology
Introduction
Remi Numata is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of advanced materials for electronic devices. With a total of 3 patents to his name, Numata's work has been instrumental in enhancing the performance and efficiency of photoresist compositions.
Latest Patents
Numata's latest patents include a positive-working quinonediazide photoresist composition. This innovative composition is designed for fine patterning work, providing excellent resolution, heat resistance, and orthogonality of the cross-sectional profile of line patterns. It features a uniform mixture of an alkali-soluble novolac resin, a naphthoquinone-1,2-diazido group-containing compound, and a specific phenolic triphenyl methane compound. This formulation allows for high sensitivity to actinic rays and a wide range of focusing depth.
Another notable patent is the positive-working naphthoquinone diazide sulfonic acid ester photoresist. This novel composition is suitable for fine patterning in electronic device manufacturing. It exhibits high resolution, sensitivity, and a large exposure dose latitude. The formulation includes an alkali-soluble novolac resin, a photosensitive ingredient, and a limited amount of 4,4'-bis(dialkylamino) benzophenone, combined with a polyhydroxy compound.
Career Highlights
Remi Numata has built a successful career at Tokyo Ohka Kogyo Co., Ltd., where he continues to innovate in the field of photoresist technology. His work has not only advanced the capabilities of photoresist materials but has also contributed to the overall progress of electronic device manufacturing.
Collaborations
Throughout his career, Numata has collaborated with notable colleagues, including Kousuke Doi and Nobuo Tokutake. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Remi Numata's contributions to photoresist technology have established him as a key figure in the field. His innovative patents and collaborative efforts continue to influence the development of advanced materials for electronic devices.