Location History:
- Sunnyvale, CA (US) (2016)
- San Jose, CA (US) (2017)
Company Filing History:
Years Active: 2016-2017
Title: Rekha Padmanabhan: Innovator in Ion Implantation Technology
Introduction
Rekha Padmanabhan is a prominent inventor based in San Jose, CA, known for her contributions to the field of ion implantation technology. With a total of 2 patents, she has made significant advancements that enhance the efficiency and effectiveness of ion beam processes.
Latest Patents
Her latest patents include a process for lower dose rate ion implantation using a wider ion beam. This innovative method involves generating an ion beam with an ion source and an extraction manipulator, which is strategically positioned to maximize the current of the ion beam. The process allows for precise implantation of ions into a workpiece, optimizing the gap distance from the exit aperture of the ion source. Another notable patent is a method for ion implantation that utilizes a non-parallel ion beam. This method enables relative motion between the workpiece and the ion beam, ensuring that all regions of the workpiece are effectively implanted, even when three-dimensional structures are present.
Career Highlights
Rekha Padmanabhan is currently employed at Advanced Ion Beam Technology, Inc., where she continues to develop cutting-edge technologies in ion implantation. Her work has positioned her as a key figure in the advancement of ion beam applications.
Collaborations
Throughout her career, Rekha has collaborated with notable colleagues, including Zhimin Wan and Kourosh Saadatmand, contributing to a dynamic and innovative work environment.
Conclusion
Rekha Padmanabhan's contributions to ion implantation technology reflect her dedication to innovation and excellence in her field. Her patents not only advance the technology but also pave the way for future developments in ion beam applications.