Company Filing History:
Years Active: 2013-2016
Title: Reizo Nunozawa: Innovator in Substrate Processing Technology
Introduction
Reizo Nunozawa is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor device manufacturing. With a total of 3 patents to his name, Nunozawa's work focuses on improving substrate processing technologies.
Latest Patents
Nunozawa's latest patents include a substrate processing apparatus and a method of manufacturing semiconductor devices. One of his innovations allows operators to be rapidly informed of delays during processing. This substrate processing apparatus features a control unit that manages a process system for substrate processing. When a delay occurs, the control unit sends an alarm message to notify the operator, ensuring timely recovery actions. Another patent describes a substrate processing apparatus that executes a first recipe for processing. If a predetermined time elapses without a new substrate being introduced, a second recipe is activated to maintain the process chamber.
Career Highlights
Reizo Nunozawa is currently employed at Hitachi Kokusai Electric Inc., where he continues to develop advanced technologies in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and reliability of substrate processing systems.
Collaborations
Nunozawa has collaborated with notable colleagues such as Yukio Ozaki and Satoru Takahata. Their combined expertise has contributed to the advancement of innovative solutions in the semiconductor industry.
Conclusion
Reizo Nunozawa's contributions to substrate processing technology reflect his commitment to innovation in the semiconductor field. His patents demonstrate a focus on improving operational efficiency and reliability in manufacturing processes.