Hitachi-kokusai Electric Inc.

Reizo Nunozawa

Satoru Takahata

Yukio Ozaki

Teruo Yoshino

Makoto Nomura

When a step is delayed, an operator can be rapidly informed of the delay. A substrate processing apparatus comprises a process system configured to process a substrate; a control unit configured to control the process system for performing a plurality of steps; and a manipulation unit configured to monitor a progress of each of the plurality of steps, wherein when a time elapsed after the control unit goes into a hold state exceeds an allowable time previously allocated to the one of the plurality of steps while waiting for a completion of the one of the plurality of steps started by the process system, the control unit transmits an alarm message to the manipulation unit so as to inform the manipulation unit that the allowable time is exceeded, terminates the hold state, and performs a recovery action.

Substrate processing apparatus and method of manufacturing semiconductor device

A substrate processing apparatus includes a control unit executing a first recipe for substrate processing. After the substrate processing is completed through the execution of the first recipe, if a predetermined time is elapsed in a state that a next substrate to be processed is not carried into the process chamber, a second recipe is executed for maintaining a process chamber where the substrate is processed.

Substrate processing apparatus

To automatically purge a transfer chamber by means of inert gas. There is provided a substrate processing apparatus including a controller that performs control so that a transfer chamberconnected to a processing chamberfor processing a substrate is purged by gas, the controller having a switching unit that switches a function of exhausting the gas in the transfer chamberin a set direction, and a function of circulating the gas through the transfer chamberin an inert gas atmosphere.

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Toyama, Japan

Reizo Nunozawa